Atom lithography with laser-cooled silicon atoms
نویسندگان
چکیده
An all-solid-state 252 nm coherent light source with external cavities for laser cooling silicon atoms using twostage highly efficient frequency conversions has been developed. With the coherent light source, it is possible to manipulate the atomic motion of the silicon atoms, which is necessary for nano-process applications. In this paper, deflection, collimation, and axial velocity selection of the silicon atomic beam with the coherent light source are discussed.
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